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Mobility fluctuations in hydrogenated amorphous silicon associated with deep defects

机译:与深缺陷相关的氢化非晶硅的迁移率波动

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摘要

A detailed study of noise in hydrogenated amorphous silicon (a-Si:H) shows that resistance fluctuations between 290 K and 430 K are mobility fluctuations and not fluctuations in the number of free carriers. Attempt rate and the average activation energy are determined for the characteristic rate constants. There are strong indications that population and depopulation of deep defects produce the mobility fluctuations. (C) 1998 Elsevier Science B.V. All rights reserved. [References: 16]
机译:对氢化非晶硅(a-Si:H)中的噪声进行的详细研究表明,在290 K和430 K之间的电阻波动是迁移率波动,而不是自由载流子数量的波动。确定特征速率常数的尝试速率和平均活化能。有充分的迹象表明,深部缺陷的种群和减少会引起迁移率波动。 (C)1998 Elsevier Science B.V.保留所有权利。 [参考:16]

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