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首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >Photosensitivity of germanium oxide and germanosilicate glass sol-gel films
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Photosensitivity of germanium oxide and germanosilicate glass sol-gel films

机译：氧化锗和锗硅酸盐玻璃溶胶-凝胶薄膜的光敏性

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摘要

Germanium oxide and germanosilicate glass films were fabricated using a sol-gel spin coating method. The formation and photobleaching of the optical absorption band of the films in the 5-eV region were measured as a function of annealing under a reducing atmosphere and ultraviolet (UV) illumination. A greater amplitude in the 5-eV absorption band was observed with increasing annealing time due to the formation of more germanium-related oxygen vacancies in the films. Also, the photobleaching of the absorption band increased with increasing illumination time. Although the amplitude of the absorption band in 5-GeO_2-50SiO_2 glass films is greater than that in germanium oxide glass films because of higher annealing temperature. germanium oxide glass films are more photosensitive due to the greater photobleachable neutral oxygen monovacancy (NOMV) concentration than non-photobleachable neutral oxygen divacancy (NODV) concentration in the films.
机译：使用溶胶-凝胶旋涂法制造氧化锗和锗硅酸盐玻璃膜。测量在5-eV区域中膜的光吸收带的形成和光漂白，其是在还原气氛和紫外线（UV）照射下退火的函数。由于在膜中形成了更多的锗相关的氧空位，随着退火时间的增加，观察到了5-eV吸收带的更大幅度。而且，吸收带的光漂白随着照明时间的增加而增加。尽管5-GeO_2-50SiO_2玻璃膜的吸收带的振幅由于退火温度较高而大于氧化锗玻璃膜的吸收带的振幅。由于薄膜中的可光漂白中性氧单价空位（NOMV）浓度高于膜中不可光漂白中性氧单价空位（NODV）的浓度，因此氧化锗玻璃薄膜的光敏性更高。

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