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首页> 外文期刊>Journal of Micromechanics and Microengineering >Influence of feature sidewall tolerance on minimum absorber thickness for LIGA X-ray masks
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Influence of feature sidewall tolerance on minimum absorber thickness for LIGA X-ray masks

机译：LIGA X射线掩模的特征侧壁公差对最小吸收体厚度的影响

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摘要

Minimizing mask absorber thickness is an important practical concern in producing very small features by the LIGA process. To assist in this minimization, we have developed coupled numerical models describing both the exposure and development of a thick polymethyl methacrylate (PMMA) resist. The exposure model addresses multi-wavelength, one-dimensional x-ray transmission through multiple beam filters, through the mask substrate and absorber, and the subsequent attenuation and photon absorption in the PMMA resist. The development model describes one-dimensional dissolution of a feature and its sidewalls, taking into account the variation in absorbed dose through the PMMA thickness. These exposure and development models are coupled in a single interactive code, permitting the automated adjustment of mask absorber thickness to yield a prescribed sidewall taper or dissolution distance. We have used this tool to compute the minimum required absorber thickness yielding a prescribed sidewall tolerance for exposures performed at the ALS, SSRL and NSLS synchrotron sources. Results are presented as a function of the absorbed dose for a range of the prescribed sidewall tolerance, feature size, PMMA thickness, mask substrate thickness and the development temperature.
机译：使掩模吸收体的厚度最小化是通过LIGA工艺生产非常小的特征的重要的实际问题。为了帮助实现这种最小化，我们开发了耦合数值模型，用于描述厚的聚甲基丙烯酸甲酯（PMMA）抗蚀剂的曝光和显影。曝光模型解决了通过多个光束滤镜，通过掩模基板和吸收体的多波长，一维x射线透射，以及随后在PMMA抗蚀剂中的衰减和光子吸收问题。该开发模型考虑了整个PMMA厚度吸收剂量的变化，描述了特征及其侧壁的一维溶解。这些曝光和显影模型以单个交互式代码耦合，从而可以自动调整掩模吸收剂的厚度，以产生规定的侧壁锥度或溶解距离。我们已经使用此工具来计算所需的最小吸收体厚度，从而为在ALS，SSRL和NSLS同步加速器源处进行的曝光产生规定的侧壁公差。在规定的侧壁公差，特征尺寸，PMMA厚度，掩膜基板厚度和显影温度范围内，结果是吸收剂量的函数。

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