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首页> 外文期刊>Journal of Photopolymer Science and Technology >Design and Characteristics of Acrylate Polymers with Alicyclic Lactone Group for ArF resists
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Design and Characteristics of Acrylate Polymers with Alicyclic Lactone Group for ArF resists

机译:ArF抗蚀剂带有脂环内酯基的丙烯酸酯聚合物的设计和特性

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摘要

We designed novel acrylate monomers with an alicyclic lactone group [3-oxa-4-oxotricyclo[5.3.1.0~(6.10)]undecanyl (OTCU) or 4,4-dimethyl-5-oxa-6-oxo tetracyclo[7.2.1.0~(2,8),0~(3,7)]dodecyl (OTCD) group] for an ArF chemically amplified resist.The polymers with these,monomer units exhibited high transparency at 193 nm and good adhesion to a Si substrate.They were also extremely durable against dry etching.The etching durability of polymer with the OTCD group was superior to that of the polymer with the OTCU group.Furthermore,a chemically amplified positive resist comprised of terpolymer with an OTCD units and a photo-acid generator achieved a resolution of 130-nm L/S with an ArF exposure system.
机译:我们设计了具有脂环族内酯基团的新型丙烯酸酯单体[3-oxa-4-氧代三环[5.3.1.0〜(6.10)]十一碳烯基(OTCU)或4,4-二甲基-5-氧代-6-氧代四环[7.2.1.0 〜(2,8),0〜(3,7)]十二烷基(OTCD)基团,用于ArF化学放大型抗蚀剂。具有这些单体单元的聚合物在193 nm处表现出高透明性,并且与Si衬底具有良好的粘合性。 OTCD基团的聚合物的蚀刻耐久性优于OTCU基团的聚合物的蚀刻耐久性。此外,获得了由具有OTCD单元的三元共聚物和光致产酸剂组成的化学放大正型抗蚀剂ArF曝光系统可实现130 nm L / S的分辨率。

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