E-beam lithography and electrodeposition fabrication of thick nanostructured devices

Lo TN; Chen YT; Chiu CW; Liu CJ; Wu SR; Lin IK; Su CI; Chang WD; Hwu Y; Shew BY

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E-beam lithography and electrodeposition fabrication of thick nanostructured devices

机译：厚纳米结构器件的电子束光刻和电沉积制造

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A nanofabrication approach based on advanced e-beam lithography and electrodeposition successfully produced high-resolution (approximate to 40 nm line width) metal structures with high aspect ratio (>12) and high density. The combination of these characteristics is essential for hard-x-ray optical components such as zone plates, for x-ray lithography masks and for other devices.

机译：基于先进的电子束光刻和电沉积的纳米加工方法成功地产生了具有高长宽比（> 12）和高密度的高分辨率（约40 nm线宽）的高分辨率金属结构。这些特性的组合对于诸如区域板的硬X射线光学组件，X射线光刻掩模以及其他设备至关重要。

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《Journal of Physics, D. Applied Physics: A Europhysics Journal》 |2007年第10期|共5页
作者
Lo TN; Chen YT; Chiu CW; Liu CJ; Wu SR; Lin IK; Su CI; Chang WD; Hwu Y; Shew BY;
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正文语种 eng
中图分类应用物理学;
关键词
X-RAY MICROSCOPY; ZONE PLATES; ELECTRON; NANOLITHOGRAPHY; METHACRYLATE; RESIST;

机译：X射线显微镜;带板;电子;纳米照相术;甲基丙烯酸酯;抗蚀剂;

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1. E-beam lithography and electrodeposition fabrication of thick nanostructured devices [J] . Lo TN, Chen YT, Chiu CW, Journal of Physics, D. Applied Physics: A Europhysics Journal . 2007,第10期

机译：厚纳米结构器件的电子束光刻和电沉积制造
2. Fabrication of Patterned Co/Pd Nanostructures Using E-Beam Lithography and Ga Ion-Irradiation [J] . Edi SUHARYADI, Takeshi KATO, Shigeru TSUNASHIMA, 電子情報通信学会技術研究報告. 磁気記録. Magnetic Recording . 2006,第599期

机译：电子束光刻和Ga离子辐照制备图案化Co / Pd纳米结构
3. Fabrication of Patterned Co/Pd Nanostructures Using E-Beam Lithography and Ga Ion-Irradiation [J] . Edi SUHARYADI, Takeshi KATO, Shigeru TSUNASHIMA, 電子情報通信学会技術研究報告. 磁気記録. Magnetic Recording . 2005,第599期

机译：电子束光刻和Ga离子辐照制备图案化Co / Pd纳米结构
4. High-energy (100-keV) e-beam lithography applied for fabrication of deep-submicrometer SAW devices on lithium niobate and quartz [C] . Author(s): Christine A. Kondek Army Research Lab. Fort Monmouth NJ USA, Louis C. Poli Army Research Lab. Ft. Monmouth NJ USA. Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V . 1984

机译：高能量（100keV）电子束光刻技术用于在铌酸锂和石英上制造深亚微米SAW器件
5. Fabrication of two-dimensional nanostructure array using nanosphere lithography and RIE etching and its application in optical devices. [D] . Wang, Jinsong. 2007

机译：使用纳米球面光刻和RIE刻蚀制造二维纳米结构阵列及其在光学器件中的应用。
6. High speed e-beam lithography for gold nanoarray fabrication and use in nanotechnology [O] . Jorge Trasobares, François Vaurette, Marc François, 2014

机译：用于金纳米阵列制造和在纳米技术中使用的高速电子束光刻
7. Fabrication of poly- and single-crystalline platinum nanostructures using hole-mask colloidal lithography, electrodeposition and annealing [O] . Wickman, Björn, Fredriksson, Hans, Gustafsson, Stefan, 2011

机译：使用孔罩胶体光刻，电沉积和退火制备多晶和单晶铂纳米结构

E-beam lithography and electrodeposition fabrication of thick nanostructured devices

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