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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Simulation of the atomic and ionic densities in the ionization layer of a plasma arc with a binary cathode
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Simulation of the atomic and ionic densities in the ionization layer of a plasma arc with a binary cathode

机译：用二元阴极模拟等离子弧电离层中的原子和离子密度

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摘要

A physical model was developed to study the behaviour of the cathode material evaporated from a thoriated tungsten cathode of an atmospheric-pressure argon plasma arc. The densities of tungsten and thorium atoms and ions in the ionization layer were obtained, and the influence of the different physical processes on the evaporated cathode material was established. It was found that almost all of the neutral atoms evaporated from the cathode are ionized near the beginning of the ionization layer, i.e. near the boundary between the sheath and the ionization layer. Thorium ions are concentrated in a 4 mu m region near the beginning of this layer, while tungsten ions are found in a region of 9 mu m. The contribution of the electric force to the velocity of ions is the dominant contribution only near the beginning of the ionization layer. At a distance from the interface between the sheath and the ionization layer greater than 3.8 mu m in the case of thorium ions, and greater than 5 mu m in the case of tungsten ions, the contributions of the density gradient forces and the frictional forces are more important than the electric force contribution.
机译：开发了一个物理模型来研究从常压氩气等离子弧的th钨阴极中蒸发出的阴极材料的行为。获得了电离层中钨，or原子和离子的密度，并建立了不同物理过程对蒸发的阴极材料的影响。发现从阴极蒸发的几乎所有中性原子在电离层的开始附近，即在鞘和电离层之间的边界附近被电离。 ium离子集中在靠近该层开始处的4微米区域，而钨离子集中在9微米区域。仅在电离层的开始附近，电力对离子速度的贡献才是主要的贡献。在from离子的情况下，距鞘与电离层之间的界面的距离大于3.8μm，在钨离子的情况下，大于5μm，则密度梯度力和摩擦力的贡献为比电力贡献更重要

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