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Noise properties of Pb/Cd-free thick film resistors

机译:无铅无镉厚膜电阻器的噪声特性

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Low-frequency noise spectroscopy has been used to examine noise properties of Pb/Cd-free RuO_2-and CaRuO_3-based thick films screen printed on alumina substrates. Experiments were performed in the temperature range 77-300 K and the frequency range 0.5-5000 Hz with multiterminal devices. The measured noise has been recognized as resistance noise that consists of background 1/f noise and components generated by several thermally activated noise sources (TANSs) of different activation energies. The total noise has been composed of the contributions generated in the resistive layer and in the resistive/conductive layers interface. These noise sources are non-uniformly distributed in the resistor volume. Noise intensity of new-resistive layers has been described by the noise parameter C_(bulk). Pb/Cd-free layers turned out to be noisier than their Pb-containing counterparts; however, the removal of Pb and Cd from resistive composition is hardly responsible for the increase in the noise. In the case of RuO_2 layers noise increases most likely due to larger grain size of RuO_2 powder used to prepare resistive pastes. Information on the quality of the resistive-to-conductive layers interface occurred to be stored in the values of noise parameter C _(int). Pb/Cd-free RuO_2-based resistive pastes form well-behaved interfaces with various Ag-based conductive pastes. In contrast, CaRuO_3-based paste forms bad contacts with AgPd terminations because the density of TANSs increases in the interface area.
机译:低频噪声光谱已用于检查丝网印刷在氧化铝基板上的无Pb / Cd的RuO_2和CaRuO_3基厚膜的噪声特性。使用多端子设备在77-300 K的温度范围和0.5-5000 Hz的频率范围内进行了实验。测得的噪声被认为是电阻噪声,由背景1 / f噪声和由具有不同激活能量的多个热激活噪声源(TANS)生成的分量组成。总噪声由在电阻层和电阻/导电层界面中产生的贡献组成。这些噪声源在电阻器体积中分布不均匀。新的电阻层的噪声强度已由噪声参数C_(bulk)描述。事实证明,无铅/无镉层比含铅的对应层更吵。然而,从电阻成分中去除Pb和Cd几乎不引起噪声的增加。在RuO_2层的情况下,由于用于制备电阻浆料的RuO_2粉末的粒径较大,噪声最有可能增加。关于电阻-导电层界面质量的信息恰好存储在噪声参数C _(int)的值中。无铅/无镉的RuO_2基电阻胶与各种银基导电胶形成良好的界面。相反,基于CaRuO_3的焊膏与AgPd端子形成不良接触,因为TANS的密度在界面区域增加。

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