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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Realization of hexagonal barium ferrite thick films on Si substrates using a screen printing technique
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Realization of hexagonal barium ferrite thick films on Si substrates using a screen printing technique

机译：使用丝网印刷技术在Si基板上实现六角形钡铁氧体厚膜

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摘要

Hexagonal barium ferrite thick films (50-200 mu m) have been deposited on Si and Al2O3/Si substrates using a screen printing technique. X-ray diffractometry, scanning electron microscopy and magnetometry were used to characterize and correlate the ferrite films' microstructure and magnetic properties. The experiments indicated that an Al2O3 underlayer was effective in preventing silicon diffusion into the barium ferrite films during a final sintering treatment at temperatures above 1100 degrees C. A two-stage sintering process allowed a reasonable tradeoff between mechanical and magnetic properties. This work reveals the feasibility of fabrication of thick ferrite films on large substrates ( up to 25mm in diameter) for future planar microwave devices compatible with semiconductor integrated circuits processing.
机译：六边形钡铁氧体厚膜（50-200μm）已使用丝网印刷技术沉积在Si和Al2O3 / Si衬底上。利用X射线衍射仪，扫描电子显微镜和磁力仪对铁素体薄膜的微观结构和磁性能进行表征和关联。实验表明，Al2O3底层可有效防止硅在1100摄氏度以上的温度下进行最终烧结过程中扩散到钡铁氧体膜中。两步烧结工艺可在机械性能和磁性能之间取得合理的平衡。这项工作揭示了在大型基板（直径最大为25mm）上制造厚铁氧体膜的可行性，以用于与半导体集成电路工艺兼容的未来平面微波器件。

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