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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Optical interference induced by deposited wall-film in inductively coupled plasmas
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Optical interference induced by deposited wall-film in inductively coupled plasmas

机译：感应耦合等离子体中沉积的壁膜引起的光学干涉

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摘要

Temporal periodic variation and long-time decrease of optical emission intensity collected by a spectrometer in an inductively coupled CH4/N-2 plasma, which deposits a film of growing thickness on the chamber wall, are measured. The periodic variation is interpreted as a result of the interference between the light reflected from the film surface and that which re-emerged from the surface after being reflected by the chamber wall. The re-emerged light is attenuated due to absorption by the film and thus leads to the long-time decrease of the intensity. The periodic variation of the line intensities, however, can be used for in situ film thickness monitoring.
机译：测量了由光谱仪在感应耦合的CH4 / N-2等离子体中收集的光发射强度随时间的周期性变化和长期降低的情况，该等离子体在室壁上沉积了厚度不断增加的薄膜。周期性变化被解释为从膜表面反射的光与被腔室壁反射后从表面重新发出的光之间干涉的结果。再次吸收的光由于被膜吸收而衰减，因此导致强度的长时间降低。然而，线强度的周期性变化可用于原位膜厚度监测。

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