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A Model for Temperature Rise of Polishing Process Considering Effects of Polishing Pad and Abrasive

机译:考虑抛光垫和磨料影响的抛光过程温升模型

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摘要

The contact temperature plays an important role in the polishing process, which essentially is a surface contact abrasion process. This paper reports a contact temperature model to predict the temperature rise of both the abrasive-workpiece and pad-workpiece interfaces in a polishing process. In this analysis, the forces acting on an abrasive particle and an asperity of the pad are derived from a mechanistic analysis of abrasive-workpiece and pad-workpiece contact. Our results elucidate that polishing with a rigid, smooth plate is a special case of our purposed model. Theoretical predictions indicate that the temperature rise of abrasive-workpiece contact increases with an increase in particle size and density of particles, hardness of workpiece, hardness of pad, and with a decrease in thermal conductivity of workpiece. The temperature of pad-workpiece contact increases with an increase in hardness of pad and surface roughness of pad, and with a decrease in thermal conductivity of workpiece. The contact temperature rise of the pad-workpiece interface is independent of the hardness of workpiece. For a metal polishing process, the maximum contact temperature occurs at the pad-workpiece contact point for small abrasive particles and rough polishing pad with high hardness.
机译:接触温度在抛光过程中起着重要作用,而抛光过程实质上是表面接触磨损过程。本文报道了一种接触温度模型,以预测抛光过程中磨料-工件和垫-工件界面的温度升高。在此分析中,作用在磨料颗粒上的力和磨垫的凹凸是从磨料工件和磨垫工件接触的机械分析得出的。我们的结果表明,使用刚性,光滑的板进行抛光是我们目标模型的特例。理论预测表明,随着颗粒尺寸和密度,工件硬度,垫板硬度以及工件导热系数的降低,磨料与工件的接触温度升高。垫-工件接触的温度随着垫的硬度和垫的表面粗糙度的增加以及工件的热导率的降低而增加。垫-工件界面的接触温度升高与工件的硬度无关。对于金属抛光过程,最大的接触温度出现在小工件和高硬度粗糙抛光垫的抛光垫-工件接触点处。

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