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首页> 外文期刊>CERAMICS INTERNATIONAL >Morphology and microstructure of ZrB2-SiC ceramics after ablation at 3000 degrees C by oxy-acetylene torch
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Morphology and microstructure of ZrB2-SiC ceramics after ablation at 3000 degrees C by oxy-acetylene torch

机译：ZrB2-SiC陶瓷在3000℃氧乙炔焊枪烧蚀后的形貌和微观结构

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摘要

Application of ZrB2-SiC ceramic at temperatures above 2500 degrees C requires evaluation of the ablation behavior of the material. The ZrB2-SiC ceramics with SiC contents of 15% and 30% in volume were fabricated by SPS under a temperature of 1580 degrees C. The ceramics were then ablated by an oxy-acetylene flame with a temperature of 3000 degrees C. It was found that ZrB2-SiC consists of three distinct ablation layers (ZrO2, SiO2-rich, and SiC-depleted) after ablation. The ablation mechanism revealed that ZrB2-SiC forms a SiO2-rich layer, which slows down the diffusion of oxygen but accelerates the active oxidation of SiC. (C) 2015 Elsevier Ltd and Techna Group S.r.l. All rights reserved.
机译：在高于2500摄氏度的温度下应用ZrB2-SiC陶瓷需要评估材料的烧蚀性能。通过SPS在1580摄氏度的温度下制造出SiC含量分别为15％和30％的ZrB2-SiC陶瓷。然后用3000摄氏度的乙炔火焰烧蚀陶瓷。 ZrB2-SiC烧蚀后由三个不同的烧蚀层组成（ZrO2，富含SiO2和贫SiC）。烧蚀机理表明，ZrB2-SiC形成了SiO2富集层，减慢了氧气的扩散，但加速了SiC的活性氧化。 （C）2015 Elsevier Ltd和Techna Group S.r.l.版权所有。

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