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Computer-generated microcooled reflection holograms in silicon for material processing with a CO2 laser

机译:硅中计算机生成的微冷反射全息图,用于使用CO2激光进行材料处理

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We report on the design, fabrication, and testing of multilevel computer-generated reflection holograms in Si for CO2 laser material processing for laser intensities of <2 kW/cm(2). The holograms are designed with an iterative method based on scalar diffraction theory. In this case the reconstructed intensity distribution is independent of the incident high-power laser mode. For achieving high diffraction efficiencies, multilevel staircase surface topologies are fabricated by multimask and reactive ion-etching technology on the front side of a polished Si wafer. For efficient hologram cooling, a gratinglike structure of microchannels is chemically etched on the back side of the Si wafer. Absorption and deformation measurements have been carried out on both a microcooled flat mirror and a reflection hologram. The maximum deformation amounts to 200 nm and is 10 times smaller than comparable conventional uncoated Cu mirrors. A diffraction efficiency of 88% is achieved with an eight-level reflection hologram and a 30-mm-diameter CO2 laser beam with a power of 5 kW. (C) 1997 Optical Society of America.
机译:我们报告了设计,制造和测试用于Si2的激光强度小于2 kW / cm(2)的CO2激光材料加工过程中多层计算机生成的反射全息图的过程。全息图是基于标量衍射理论的迭代方法设计的。在这种情况下,重建的强度分布与入射高功率激光模式无关。为了获得高衍射效率,通过多层掩模和反应性离子蚀刻技术在抛光的硅晶片的正面制作了多层阶梯表面拓扑。为了有效的全息图冷却,在硅晶片的背面化学蚀刻了微通道的光栅状结构。在微冷却的平面镜和反射全息图上均进行了吸收和变形测量。最大变形量为200 nm,比可比的常规未镀膜铜镜小10倍。八级反射全息图和直径为30毫米,功率为5 kW的CO2激光束可实现88%的衍射效率。 (C)1997年美国眼镜学会。

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