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Emissivity modeling of metals during the growth of oxide film and comparison of the model with experimental results

机译:氧化膜生长过程中金属的发射率建模及其与实验结果的比较

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Emissivity modeling of metals has been developed to elucidate behavior during the growth of oxide film, and the modeling results have been compared with experimental results. To express emissivities, pseudo-optical constants of a bare metal and of an oxide film obtained by an ellipsometer are substituted into the model equations. Emissivity behavior during the growth of an oxide film upon the surface of a specimen is shown in terms of spectral, directional, and polarized characteristics, and it coincides with the experimental results, both quantitatively and qualitatively. The modeling is simple and provides useful guidance for the development of emissivity-compensated radiation thermometry. (C) 2003 Optical Society of America. [References: 22]
机译:已经开发出金属的发射率模型以阐明氧化膜生长过程中的行为,并将模型结果与实验结果进行了比较。为了表示发射率,将通过椭圆偏振仪获得的裸金属和氧化膜的拟光学常数代入模型方程式。用光谱,方向和偏振特性显示了在样品表面上氧化膜生长过程中的发射率行为,从数量和质量上看,它与实验结果一致。该建模非常简单,并为开发发射率补偿的辐射温度计提供了有用的指导。 (C)2003年美国眼镜学会。 [参考:22]

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