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Improved rate control for electron-beam evaporation and evaluation of optical performance improvements

机译:改进的电子束蒸发速率控制和光学性能评估

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摘要

A new deposition-rate-control and electron-beam-gun (e-gun) strategy was developed that significantly reduces the growth-rate variations for e-beam-deposited SiO_(2) coatings. The resulting improvements in optical performance are evaluated for multilayer bandpass filters. The adverse effect of uneven silicasource depletion on coating spectral performances during long deposition runs is discussed.
机译:开发了一种新的沉积速率控制和电子束枪(e-gun)策略,该策略显着降低了电子束沉积SiO_(2)涂层的生长速率变化。对于多层带通滤波器,评估了光学性能的最终改善。讨论了漫长的沉积过程中不均匀的二氧化硅源损耗对涂层光谱性能的不利影响。

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