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Ellipsometry of reflected and scattered fields for the analysis of substrate optical quality

机译:反射和散射场的椭偏仪用于分析基板的光学质量

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摘要

Specular ellipsometry is a well-known and efficient technique to characterize surfaces and coatings. This technique has been extended to the measurement of scattered light. We present an experimental setup, using a polarization modulator, which permits us to characterize transition layers and roughness without a calibration procedure. Experimental results are presented concerning transition layers for damage threshold applications and for rough surfaces or bulks.
机译:镜面椭圆仪是一种众所周知的有效表征表面和涂层的技术。该技术已扩展到散射光的测量。我们介绍了使用偏振调制器的实验装置,该装置无需校准即可表征过渡层和粗糙度。给出了有关用于损伤阈值应用以及粗糙表面或块体的过渡层的实验结果。

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