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Effects of temperature on columnar microstructure and recrystallization of TiO_(2) film produced by ion-assisted deposition

机译：温度对离子辅助沉积法制备TiO_（2）薄膜柱状组织和再结晶的影响

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摘要

Titanium oxide thin films were deposited by electron-beam evaporation with ion-beam-assisted deposition. The effect of the substrate temperature and annealing temperature on the columnar microstructure and recrystallization of titanium oxide was studied. The values of the refractive index varied from 2.26 to 2.4, indicating that the different substrate temperatures affected the film density. X-ray diffraction revealed that all films were amorphous as deposited. At annealing temperatures from 100 deg C to 300 deg C, only the anatase phase was formed. As the substrate temperature increased from 150 deg C to 200 deg C to 250 deg C, the recrystallization temperature fell from 300 deg C through 250 deg C to 200 deg C. Changing the substrate temperature resulted in the formation of various types of columnar microstructure, as determined by scanning-electron microscopy. Different columnar structures resulted in different surface morphologies, as measured by atomic-force microscopy.
机译：通过电子束蒸发和离子束辅助沉积来沉积二氧化钛薄膜。研究了衬底温度和退火温度对氧化钛柱状组织和重结晶的影响。折射率的值在2.26到2.4之间变化，表明不同的基板温度会影响薄膜密度。 X射线衍射表明，所有膜在沉积时都是非晶态的。在100℃至300℃的退火温度下，仅形成锐钛矿相。随着基板温度从150摄氏度增加到200摄氏度到250摄氏度，重结晶温度从300摄氏度降低到250摄氏度到200摄氏度。改变基板温度会导致形成各种类型的柱状微结构，由扫描电子显微镜确定。通过原子力显微镜测量，不同的柱状结构导致不同的表面形态。

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