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Nanoscale defect detection by heterodyne interferometry

机译:外差干涉法检测纳米级缺陷

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We construct an instrument that facilitates the measurement of nanoscale defects. It is based on heterodyne interferometry with phase measurement that utilizes a polarizing beam splitter to form a measuring signal and an oscillating cantilever tip that acts as a scanning probe to get the measurement values of sample topography. The dependence of the tip displacement on the variation of tip-sample distance and the comb scanning of the sample topography are investigated by experiments. The results prove that the tip displacement increases and is enough to be discriminated in various positions where the sample is approached. The system has been successfully utilized to measure the defect characterization by measuring the pitch of the standard sample. The results also show that the heterodyne system has good repeatability, a large measurement range, and high accuracy, with a measurement stability of 0.5 nm.
机译:我们构建了一种有助于纳米级缺陷测量的仪器。它基于具有相位测量功能的外差干涉测量技术,该技术利用偏振分束器形成测量信号,并使用振荡悬臂尖端作为扫描探针,以获取样品形貌的测量值。通过实验研究了针尖位移对针尖-样品距离变化和样品形貌的梳状扫描的依赖性。结果证明,尖端位移增加,并且足以在接近样品的各个位置进行区分。该系统已成功用于通过测量标准样品的螺距来测量缺陷特征。结果还表明,外差系统具有良好的重复性,较大的测量范围和较高的精度,测量稳定性为0.5 nm。

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