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Optical coatings in microscale channels by atomic layer deposition

机译：通过原子层沉积的微细通道中的光学涂层

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High-aspect-ratio channels may be coated using atomic layer deposition (ALD) due to the unique self-limiting nature of the process, and this has been often demonstrated using deep reactive-ion etched trenches in silicon. However, for optical and microfluidic applications, many channels are centimeters deep with diameters of tens to hundreds of micrometers, and the relatively large area exposes more difficult problems of temperature and gas flow uniformity. To quantify the uniformity of optical coatings deposited by ALD under those conditions, an air wedge has been created between two square wafers of silicon approximately 7 cm on a side, with the air gap varying linearly from 0-1560 (mu)m. ALD aluminum oxide uniformity is astounding, while hafnium oxide shows a need for process optimization, but still exceeds the capability observed in other deposition techniques. A six-layer Fabry-Perot optical cavity with fixed 500 nm resonance was deposited inside a wedge, and the measured resonant wavelength closely matched predictions, except at the deepest regions of the wedge.
机译：由于该工艺具有独特的自限制特性，因此可以使用原子层沉积（ALD）来涂覆高纵横比的通道，并且经常在硅中使用深反应离子蚀刻的沟槽来证明这一点。然而，对于光学和微流体应用，许多通道的深度为厘米，直径为数十至数百微米，并且相对较大的面积暴露出温度和气流均匀性的更困难的问题。为了量化在这些条件下由ALD沉积的光学涂层的均匀性，在侧面约7 cm的两个方形硅晶片之间创建了一个空气楔，其气隙在0-1560μm范围内线性变化。 ALD氧化铝的均匀性令人震惊，而氧化ha显示出工艺优化的必要性，但仍超过了其他沉积技术中观察到的能力。具有固定的500 nm共振的六层Fabry-Perot光学腔被沉积在楔形物内部，除了在楔形物最深的区域外，所测得的共振波长与预测值非常接近。

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