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Improving thin-film manufacturing yield with robust optimization

机译:通过稳健的优化提高薄膜制造良率

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摘要

A novel robust optimization algorithm is demonstrated that is largely deterministic, and yet it attempts to account for statistical variations in coating. Through Monte Carlo simulations of manufacturing, we compare the performance of a proof-of-concept antireflection (AR) coating designed with our robust optimization to that of a conventionally optimized AR coating. We find that the robust algorithm produces an AR coating with a significantly improved yield.
机译:展示了一种新颖的鲁棒性优化算法,该算法在很大程度上是确定性的,但仍试图解决涂层的统计变化。通过蒙特卡洛(Monte Carlo)的制造模拟,我们比较了通过稳健的优化设计的概念验证抗反射(AR)涂层与传统优化的AR涂层的性能。我们发现健壮的算法可以产生具有显着提高的良率的增透膜。

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