Interferometric lithography for nanoscale feature patterning: a comparative analysis between laser interference, evanescent wave interference, and surface plasmon interference

Kandammathe Valiyaveedu Sreekanth; Jeun Kee Chua; Vadakke Matham Murukeshan

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Interferometric lithography for nanoscale feature patterning: a comparative analysis between laser interference, evanescent wave interference, and surface plasmon interference

机译：用于纳米级特征图案的干涉光刻：激光干涉，van逝波干涉和表面等离子体激元干涉之间的比较分析

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In this paper, we experimentally demonstrate and compare single-exposure multiple-beam interference lithography based on conventional laser interference, evanescent wave interference, and surface plasmon interference. The proposed two-beam and four-beam interference approaches are carried out theoretically and verified experimentally, employing the proposed configurations so as to realize the patterning of one- and two-dimensional periodic features on photoresists. A custom-fabricated grating is employed in the configuration in order to achieve two- and four-beam interference.

机译：在本文中，我们通过实验证明和比较了基于常规激光干涉，e逝波干涉和表面等离子体激元干涉的单曝光多光束干涉光刻。理论上进行了提出的两光束和四光束干涉方法，并利用提出的配置进行了实验验证，以实现在光致抗蚀剂上的一维和二维周期性特征的图案化。为了实现两束和四束干涉，在配置中使用了定制的光栅。

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《Applied optics》 |2010年第35期|共8页
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Kandammathe Valiyaveedu Sreekanth; Jeun Kee Chua; Vadakke Matham Murukeshan;
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1. Interferometric lithography for nanoscale feature patterning: a comparative analysis between laser interference, evanescent wave interference, and surface plasmon interference [J] . Kandammathe Valiyaveedu Sreekanth, Jeun Kee Chua, Vadakke Matham Murukeshan Applied optics . 2010,第35期

机译：用于纳米级特征图案的干涉光刻：激光干涉，van逝波干涉和表面等离子体激元干涉之间的比较分析
2. Interference pattern generation in evanescent electromagnetic waves for nanoscale lithography using waveguide diffraction gratings [J] . Bezus E.A., Doskolovich L.L., Kazanskiy N.L. Quantum electronics . 2011,第8期

机译：使用波导衍射光栅的瞬态电磁波在纳米级光刻中产生干涉图样
3. Four beams surface pIasmon interference nanoscale lithography for patterning of two-dimensional periodic features [J] . K. V. Sreekanth, V. M. Murukeshan Journal of Vacuum Science & Technology . 2010,第1期

机译：用于二维周期性特征图案化的四束表面等离子干涉纳米级光刻
4. Measurement of nanoscale surface patterns produced by two-beam laser interference lithography [C] . Pan Haiyan, Liu Lanjiao, Xu Jia, Proceedings of the 2010 International Conference on Mechatronics and Automation . 2010

机译：测量两束激光干涉光刻产生的纳米级表面图案
5. Laser interference lithography for large area patterning and the fabrication of functional nanostructures [D] . Wathuthanthri, Ishan 2015

机译：激光干涉光刻技术，用于大面积构图和功能纳米结构的制造
6. Large area and deep sub-wavelength interference lithography employing odd surface plasmon modes [O] . Liqin Liu, Yunfei Luo, Zeyu Zhao, -1

机译：采用奇数表面等离子体激元模式的大面积深亚波长干涉光刻
7. High resolution imaging and lithography using interference of light and surface plasmon waves [O] . Kim Yang-Hyo 2007

机译：使用光和表面等离子体波的干涉的高分辨率成像和光刻

Interferometric lithography for nanoscale feature patterning: a comparative analysis between laser interference, evanescent wave interference, and surface plasmon interference

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