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Antireflective subwavelength structures on microlens arrays--comparison of various manufacturing techniques

机译:微透镜阵列上的抗反射亚波长结构-各种制造技术的比较

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摘要

Antireflective subwavelength structures (ARS) resembling nanostructures found on the cornea of night-active insects reduce the reflection of light by providing a gradual change in the refractive index at the interface. These artificial ARS have mainly been fabricated by a combination of conventional lithography and reactive ion etching, which constrains their application to planar substrates. We report on the fabrication of ARS using three different techniques including bottom-up and top-down methods as well as their combination on microlens arrays (MLAs) made of fused silica. The optical performance of the resulting ARS on the MLAs is as good as ARS fabricated on planar substrates with increased transmission of up to 96percent at certain wavelengths.
机译:类似于夜活动昆虫角膜上发现的纳米结构的减反射亚波长结构(ARS)通过在界面处提供逐渐变化的折射率来减少光的反射。这些人造ARS主要是通过常规光刻和反应离子刻蚀的组合来制造的,这限制了它们在平面基板上的应用。我们报告了使用三种不同技术制造ARS的技术,包括自下而上和自上而下的方法,以及它们在由熔融石英制成的微透镜阵列(MLA)上的组合。最终的ARS在MLA上的光学性能与在平面基板上制造的ARS一样好,并且在某些波长下的透射率提高了96%。

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