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Study of a novel and simple method of generating binary mask for microprism fabrication

机译：研究一种新型且简单的微棱镜制备二元掩模的方法

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摘要

A new and simple method for generating binary masks for fabrication of gray scale micro-optical ele- ments is proposed and examined. In this technique the main idea is superimposing two or more gratings with slightly different pitches that depend on the considered gray tone level. This causes generation of a chirped binary mask in which the openings widths are changed from a maximum to minimum through considered steps. Furthermore, to show its capability, it was applied to fabricate some microprisms. In addition, influence of proximity gap, and designation parameters on the surface quality were studied. It is shown that surface deterioration is effectively modified by optimizing the designation parameters. In comparison to other techniques, one of the advantages of this method is to have an assortment of pulse modulated masks that are able to create a variety of gray tone levels. Other advantages are ease in designation and implementation, and the fact that surface roughness could be smoothed effectively by aptly optimized parameters. Theoretical approach, simulation works, and experimental results are presented.
机译：提出并研究了一种新的简单方法，用于生成用于制造灰度微光学元件的二进制掩模。在这种技术中，主要思想是叠加两个或多个光栅，这些光栅的间距取决于所考虑的灰度等级，其间距略有不同。这导致产生a二进制掩模，其中通过考虑的步骤将开口宽度从最大改变为最小。此外，为了显示其功能，将其应用于制造一些微棱镜。另外，研究了接近间隙和指定参数对表面质量的影响。结果表明，通过优化指定参数可以有效地改善表面劣化。与其他技术相比，此方法的优点之一是拥有各种能够产生各种灰度等级的脉冲调制掩模。其他优点是易于设计和实施，并且可以通过适当优化参数有效地平滑表面粗糙度。介绍了理论方法，仿真工作和实验结果。

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