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Binary diffractive mask as a beam-shaping element for direct application in large-angle gray scale element fabrication

机译:二元衍射掩模作为光束整形元件,可直接应用于大角度灰度元件制造中

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摘要

The capability of binary gray scale masks in generating beams with a desired lateral intensity profile is extensively studied in order to fabricate large-angle microprisms. Using a recently introduced technique, some samples based on pulsewidth modulation are designed, so that the pulsewidth is changed with different linear rates from a completely clear to a fully dark slit, which results in a different number of gray steps. Then, the influence of the rate on turning an incident plane wave into beams with different specially linear lateral intensity distributions was studied by simulation, experiment, and fabrication of a large-angle microprism. Further, it was shown that the width of the first slit and the increment of gray level have an effective impact on the slope and smoothness of the generated linear intensity profile across the beam. Simulation results are completely verified by experimental data and the fabricated linear gray scale element.
机译:为了制造大角度的微棱镜,广泛研究了二元灰度掩模在产生具有所需横向强度分布的光束中的能力。使用最新引入的技术,设计了一些基于脉宽调制的样本,从而使脉宽以不同的线性速率从完全清晰的缝隙变为完全暗的缝隙,从而导致不同数量的灰度级。然后,通过模拟,实验和大角度微棱镜的制造,研究了速率对将入射平面波转换成具有不同的特别线性横向强度分布的光束的影响。此外,已经表明,第一缝隙的宽度和灰度级的增加对所产生的横过光束的线性强度分布的斜率和平滑度具有有效的影响。仿真结果已通过实验数据和制造的线性灰度元件完全验证。

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