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Annealing effects on microstructure and laser-induced damage threshold of HfO2/SiO2 multilayer mirrors

机译:退火对HfO2 / SiO2多层反射镜微观结构和激光损伤阈值的影响

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HfO2/SiO2 periodic multilayer high reflection mirrors have been prepared by a reactive electron-beam evaporation technique. The deposited mirrors were annealed in the temperature range from 300 degrees C to 500 degrees C. The effects of annealing on optical, microstructural, and laser-induced damage characteristics of the mirrors have been investigated. The high reflection band of the mirror shifts toward a shorter wavelength with increasing annealing temperature. As-deposited and annealed mirrors show polycrystalline structure with a monoclinic phase of HfO2. Crystalinity and grain size increase upon annealing. The laser-induced damage threshold (LIDT) has been assessed using a 532 nm pulsed laser at a pulse width of 7 ns. The LIDT value of the multilayer mirror increases from 44.1 J/cm(2) to 77.6 J/cm(2) with annealing up to 400 degrees C. The improvement of LIDT with annealing is explained through oxygen vacancy defects as well as grain-size-dependent thermal conductivity. Finally, the observed laser damage morphology, such as circular scalds and ablated multilayer stacks with terrace structure, are analyzed. (C) 2016 Optical Society of America.
机译:通过反应电子束蒸发技术制备了HfO2 / SiO2周期性多层高反射镜。沉积的反射镜在300摄氏度至500摄氏度的温度范围内进行退火。已研究了退火对反射镜的光学,微观结构和激光诱导的损伤特性的影响。随着退火温度的升高,反射镜的高反射带向较短的波长移动。沉积和退火后的反射镜显示出具有HfO2单斜晶相的多晶结构。退火时结晶度和晶粒尺寸增加。已使用532 nm脉冲激光以7 ns的脉冲宽度评估了激光诱导的损伤阈值(LIDT)。退火温度高达400摄氏度时,多层反射镜的LIDT值从44.1 J / cm(2)增加到77.6 J / cm(2)。通过氧空位缺陷和晶粒尺寸可以解释LIDT随着退火的改善依赖的热导率。最后,分析了观察到的激光损伤形态,例如圆形烫伤和具有台面结构的烧蚀多层堆叠。 (C)2016年美国眼镜学会。

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