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首页> 外文期刊>Electrochimica Acta >p-Type and n-type Cu_2O semiconductor thin films: Controllable preparation by simple solvothermal method and photoelectrochemical properties
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p-Type and n-type Cu_2O semiconductor thin films: Controllable preparation by simple solvothermal method and photoelectrochemical properties

机译:p型和n型Cu_2O半导体薄膜:通过简单的溶剂热法和光电化学性能可控地制备

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摘要

p-Type and n-type Cu_2O thin films were controllably prepared using a simple solvothermal method by adjusting pH value of the copper (II) acetate aqueous solution. Photoelectrochemical experiments show that the Cu_2O thin films synthesized in acid and alkaline (or neutral) media present n-type and p-type semiconductor character, respectively. Moreover, the films prepared at pH 5 have the best photoelectrochemical properties. The mechanism for the formation of these p-type and n-type Cu_2O films is discussed. The Cu_2O p-n homojunction fabricated in this study shows typical p-n junction character. This facile preparation method may be a promising way to prepare p-n homojunctions for semiconductor devices.
机译:通过简单的溶剂热法,通过调节乙酸铜(II)水溶液的pH值,可控制地制备p型和n型Cu_2O薄膜。光电化学实验表明,在酸性和碱性(或中性)介质中合成的Cu_2O薄膜分别具有n型和p型半导体特性。此外,在pH 5下制备的薄膜具有最佳的光电化学性能。讨论了这些p型和n型Cu_2O薄膜的形成机理。在这项研究中制造的Cu_2O p-n同质结显示出典型的p-n结特征。这种简便的制备方法可能是制备半导体器件的p-n同质结的有前途的方法。

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