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Graphite patterning in a controlled gas environment

机译：受控气体环境中的石墨图案

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Although a number of methods using scanning probe lithography to pattern graphene have already been introduced, the fabrication of real devices still faces limitations. We report graphite patterning using scanning probe lithography with control of the gas environment. Patterning processes using scanning probe lithography of graphite or graphene are normally performed in air because water molecules forming the meniscus between the tip and the sample mediate the etching reaction. This water meniscus, however, may prevent uniform patterning due to its strong surface tension or large contact angle on surfaces. To investigate this side effect of water, our experiment was performed in a chamber where the gas environment was controlled with methyl alcohol, oxygen or isopropanol gases. We found that methyl alcohol facilitates graphite etching, and a line width as narrow as 3nm was achieved as methyl alcohol also contains an oxygen atom which gives rise to the required oxidation. Due to its low surface tension and highly adsorptive behavior, methyl alcohol has advantages for a narrow line width and high speed etching conditions.
机译：尽管已经引入了许多使用扫描探针光刻技术对石墨烯进行图案化的方法，但实际器件的制造仍然面临局限性。我们报告使用扫描探针光刻技术控制气体环境的石墨图案。由于在尖端和样品之间形成弯液面的水分子介导了蚀刻反应，因此通常在空气中执行使用石墨或石墨烯的扫描探针光刻的图案化工艺。但是，该水弯液面由于其强大的表面张力或在表面上的大接触角而可能阻止均匀的图案。为了研究水的这种副作用，我们的实验是在一个用甲醇，氧气或异丙醇气体控制气体环境的室内进行的。我们发现，甲醇可促进石墨刻蚀，并且由于甲醇还包含一个氧原子，可引起所需的氧化，因此线宽可缩小至3nm。由于其低的表面张力和高度的吸附性能，甲醇对于窄线宽和高速蚀刻条件具有优势。

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