• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Nanotechnology >Fabrication of graphene-based ? exible devices utilizing a soft lithographic patterning method
【24h】

Fabrication of graphene-based ? exible devices utilizing a soft lithographic patterning method

机译：石墨烯基的制造利用软光刻图案化方法的柔性设备

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

There has been considerable interest in soft lithographic patterning processing of large scale graphene sheets due to the low cost and simplicity of the patterning process along with the exceptional electrical or physical properties of graphene. These properties include an extremely high carrier mobility and excellent mechanical strength. Recently, a study has reported that single layer graphene grown via chemical vapor deposition (CVD) was patterned and transferred to a target surface by controlling the surface energy of the polydimethylsiloxane (PDMS) stamp. However, applications are limited because of the challenge of CVD-graphene functionalization for devices such as chemical or bio-sensors. In addition, graphene-based layers patterned with a micron scale width on the surface of biocompatible silk ? broin thin ? lms, which are not suitable for conventional CMOS processes such as the patterning or etching of substrates, have yet to be reported. Herein, we developed a soft lithographic patterning process via surface energy modi ? cation for advanced graphene-based ? exible devices such as transistors or chemical sensors. Using this approach, the surface of a relief-patterned elastomeric stamp was functionalized with hydrophilic dimethylsulfoxide molecules to enhance the surface energy of the stamp and to remove the graphene-based layer from the initial substrate and transfer it to a target surface. As a proof of concept using this soft lithographic patterning technique, we demonstrated a simple and ef ? cient chemical sensor consisting of reduced graphene oxide and a metallic nanoparticle composite. A ? exible graphene-based device on a biocompatible silk ? broin substrate, which is attachable to an arbitrary target surface, was also successfully fabricated. Brie ? y, a soft lithographic patterning process via surface energy modi ? cation was developed for advanced graphene-based ? exible devices such as transistors or chemical sensors and attachable devices on a biocompatible silk ? broin substrate. Signi ? cantly, this soft lithographic patterning technique enables us to demonstrate a simple and ef ? cient chemical sensor based on reduced graphene oxide (rGO), a metallic nanoparticle composite, and an attachable graphene-based device on a silk ? broin thin ? lm.
机译：由于图案化工艺的低成本和简单性以及石墨烯的优异电学或物理性能，因此对大规模石墨烯片的软光刻图案化处理已经引起了相当大的兴趣。这些特性包括极高的载流子迁移率和出色的机械强度。最近，一项研究报告称，通过控制聚二甲基硅氧烷（PDMS）压模的表面能，可以将通过化学气相沉积（CVD）生长的单层石墨烯图案化并转移到目标表面。但是，由于对化学或生物传感器等设备的CVD石墨烯功能化提出了挑战，因此应用受到限制。另外，在生物相容性丝的表面上以微米尺度的宽度图案化的石墨烯基层。细细的？不适用于常规CMOS工艺（例如基板的图案化或蚀刻）的lms尚未报道。本文中，我们通过表面能改进了一种软光刻构图工艺。阳离子用于高级石墨烯基？诸如晶体管或化学传感器之类的易用设备。使用这种方法，用亲水性二甲基亚砜分子对浮雕图案的弹性体压模的表面进行功能化，以增强压模的表面能，并从初始基材上去除石墨烯基层，并将其转移至目标表面。作为使用这种软光刻图案技术的概念证明，我们展示了一种简单而有效的方法。由还原的氧化石墨烯和金属纳米粒子复合物组成的高效化学传感器。一种 ？生物相容性丝绸上基于石墨烯的可替代设备？还成功地制造了可附着到任意目标表面的溴衬底。布里干酪 ？ y，通过表面能改进的软光刻构图工艺阳离子是为高级石墨烯基开发的。诸如晶体管或化学传感器之类的柔性设备以及生物相容性丝绸上的可连接设备？溴底物。 Signi？坦率地说，这种软光刻图案化技术使我们能够展示一种简单而有效的方法。基于还原型氧化石墨烯（rGO），金属纳米颗粒复合材料以及可附着在丝上的基于石墨烯的装置的高效化学传感器？细细的？ lm。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号