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首页> 外文期刊>Nanotechnology >Photonic sintering via flash white light combined with deep UV and NIR for SrTiO3 thin film vibration touch panel applications
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Photonic sintering via flash white light combined with deep UV and NIR for SrTiO3 thin film vibration touch panel applications

机译：通过闪光灯白光与深紫外线和近红外光结合进行光子烧结，用于SrTiO3薄膜振动触摸屏应用

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摘要

An ultra-high speed photonic sintering method consisting of flash white light (FWL) combined with near infrared (NIR) and deep UV light irradiations was developed to fabricate a SrTiO3 (STO) thin film for application in electro-vibration touch panels. The STO thin film was sintered on PEN by FWL irradiation at room temperature under ambient conditions, which is a dramatically simple and ultrahigh speed fabrication process compared to the conventional high temperature (600 degrees C-900 degrees C) thermal sintering process. The effects of the FWL irradiation conditions (energy density, pulse numbers, and pulse duration) on the dielectric constant of the sintered STO thin films were evaluated. Furthermore, the effects of NIR and deep UV irradiation during the FWL sintering process were also investigated.
机译：开发了一种由闪光灯白光（FWL）结合近红外（NIR）和深紫外光照射组成的超高速光子烧结方法，以制备用于电振动触摸屏的SrTiO3（STO）薄膜。在室温和环境条件下，通过FWL辐射在PEN上烧结STO薄膜，与传统的高温（600摄氏度至900摄氏度）热烧结工艺相比，这是一种极其简单且超高速的制造工艺。评估了FWL照射条件（能量密度，脉冲数和脉冲持续时间）对STO烧结薄膜介电常数的影响。此外，还研究了近红外和深紫外辐射在FWL烧结过程中的影响。

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