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Investigating the interaction of x-ray free electron laser radiation with grating structure

机译:研究X射线自由电子激光辐射与光栅结构的相互作用

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摘要

The interaction of free electron laser pulses with grating structure is investigated using 4.6 +- 0.1 nm radiation at the FLASH facility in Hamburg. For fluences above 63.7 +- 8.7 mJ/cm~(2), the interaction triggers a damage process starting at the edge of the grating structure as evidenced by optical and atomic force microscopy. Simulations based on solution of the Helmholtz equation demonstrate an enhancement of the electric field intensity distribution at the edge of the grating structure. A procedure is finally deduced to evaluate damage threshold.
机译:在汉堡的FLASH设施中,使用4.6±0.1 nm辐射研究了自由电子激光脉冲与光栅结构的相互作用。对于高于63.7±8.7 mJ / cm〜(2)的注量,相互作用会从光栅结构的边缘开始触发损伤过程,这在光学和原子力显微镜下都得到了证明。基于Helmholtz方程解的仿真表明,光栅结构边缘的电场强度分布有所增强。最后推导出评估损伤阈值的程序。

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