Electron beam position monitor for a dielectric microaccelerator

Ken Soong; Edgar A. Peralta; R. Joel England; Ziran Wu; Eric R. Colby; Igor Makasyuk; James P. MacArthur; Andrew Ceballos; Robert L. Byer

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Electron beam position monitor for a dielectric microaccelerator

机译：介电微加速器的电子束位置监控器

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We report the fabrication and first demonstration of an electron beam position monitor for a dielectric microaccelerator. This device is fabricated on a fused silica substrate using standard optical lithography techniques and uses the radiated optical wavelength to measure the electron beam position with a resolution of 10 μm, or 7% of the electron beam spot size. This device also measures the electron beam spot size in one dimension.

机译：我们报告了介电微加速器的电子束位置监控器的制造和首次演示。该设备使用标准的光学光刻技术在熔融石英衬底上制造，并使用辐射的光波长以10μm的分辨率或电子束光斑尺寸的7％测量电子束位置。该设备还可以在一维上测量电子束斑点的大小。

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《Optics Letters》 |2014年第16期|共4页
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Ken Soong; Edgar A. Peralta; R. Joel England; Ziran Wu; Eric R. Colby; Igor Makasyuk; James P. MacArthur; Andrew Ceballos; Robert L. Byer;
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1. Electron beam position monitor for a dielectric microaccelerator [J] . Ken Soong, Edgar A. Peralta, R. Joel England, Optics Letters . 2014,第16期

机译：介电微加速器的电子束位置监控器
2. In situ beam drift detection using a two-dimensional electron-beam position monitoring system for multiple-electron-beam-direct-write lithography [J] . Sheng-Yung Chen (陳勝勇), Kuen-Yu Tsai (蔡坤諭), Philip C. W. Ng (黃飛歷), Journal of Vacuum Science & Technology . 2011,第4期

机译：使用二维电子束位置监视系统的原位电子束漂移检测，用于多电子束直接写入光刻
3. Electro-optic sampling beam position monitor for relativistic electron beams [J] . Keenan Hunt-Stone, Robert Ariniello, Christopher Doss, Nuclear Instruments & Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment . 2021,第MAYa21期

机译：相对论电子束的电光采样光束位置监视器
4. Preliminary Design of a Two-Dimensional Electron Beam Position Monitor System for Multiple-Electron-Beam-Direct-Write Lithography [C] . Sheng-Yung Chen, rnKuen-Yu Tsai, rnHoi-Tou Ng, Lithography Asia 2009 . 2009

机译：多束电子束直接写入光刻的二维电子束位置监测系统的初步设计
5. Dielectric thin-films by ion-beam sputtering deposition for III-V based infrared optoelectronic imaging. [D] . Nguyen, Jean. 2008

机译：通过离子束溅射沉积的介电薄膜，用于基于III-V的红外光电成像。
6. Fluorescence intensity monitors as intensity and beam-position diagnostics for X-ray free-electron lasers [O] . Philip Heimann, Alexander Reid, Yiping Feng, -1

机译：荧光强度监测仪用于X射线自由电子激光器的强度和束位置诊断
7. Calibration of an Advanced Photon Source Linac Beam Position Monitor Used for Positron Position Measurement of a Beam Containing Both Positrons and Electrons [O] . Nicholas Sereno 2007

机译：用于同时包含正电子和电子束的正电子位置测量的高级光子源直线加速器束位置监视器的校准
8. Calibration of an Advanced Photon Source linac beam position monitor used for positron position measurement of a beam containing both positrons and electrons. [R] . Sereno, N. S. 1998

机译：校准高级光子源直线加速器光束位置监视器，用于正电子位置测量包含正电子和电子的光束。

Electron beam position monitor for a dielectric microaccelerator

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