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首页> 外文期刊>Optics Letters >Focused laser lithographic system with sub-wavelength resolution based on vortex laser induced opacity of photochromic material
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Focused laser lithographic system with sub-wavelength resolution based on vortex laser induced opacity of photochromic material

机译：基于涡旋激光诱导的光致变色材料不透明性的亚波长聚焦激光光刻系统

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A focused laser lithographic system combines with vortex laser induced opacity of photochromic layer to write patterns with linewidth below wavelength. A photochromic layer is formed by coating the mixture of metanil yellow and aqueous PVA solution on the photoresist layer. In our system, the center of a lithographic laser with a 405 nm wavelength coincides with the center of vortex laser with a 532 nm wavelength. When a photochromic layer is illuminated by both lasers simultaneously, the absorbance for the lithographic laser decreases at the hollow region of the vortex laser but increases at its annular region, so that a transparent aperture for the lithographic laser is created and its size could be tuned by changing the power of vortex laser; therefore, the linewidth of written patterns is variable. Experimentally, using a 20x lens (NA = 0.4), this system condenses the linewidth of written patterns from 6614 to 350 nm. (C) 2014 Optical Society of America
机译：聚焦激光光刻系统与涡旋激光诱导的光致变色层不透明性相结合，以写入线宽低于波长的图案。通过将间甲黄和PVA水溶液的混合物涂覆在光致抗蚀剂层上来形成光致变色层。在我们的系统中，波长为405 nm的光刻激光的中心与波长为532 nm的涡旋激光的中心重合。当两个激光器同时照射光致变色层时，光刻激光的吸光度在涡旋激光器的中空区域减小，但在其环形区域增大，因此为光刻激光创建了一个透明孔，并且可以调整其大小通过改变涡旋激光的功率;因此，书写图案的线宽是可变的。实验上，使用20倍透镜（NA = 0.4），该系统可缩小6614至350 nm的书写图案的线宽。 （C）2014年美国眼镜学会

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