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首页> 外文期刊>Physica, B. Condensed Matter >Densification study of ITO films during high temperature annealing by GISAXS
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Densification study of ITO films during high temperature annealing by GISAXS

机译：GISAXS在高温退火过程中对ITO薄膜的致密化研究

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摘要

Three thermal routes were treated on the sol-gel ITO films, i.e. conventional thermal annealing (CTA), rapid thermal annealing (RTA) and thermal cycle annealing (TCA). The near surface and internal structures of films were characterized by grazing incidence small angle X-ray scattering (GISAXS) technique. It is found that slit-like pores show fractal structures laterally and the near surface is sparser with bigger pores. Ordered pore structure normal to the film appears when films are annealed at high heating rate. The shrinkage of pores is mainly owing to structural relaxation and diffusion during the superheating process. However, the supercooling process has no significant effect on the structures. Furthermore, CTA samples have the greatest porosity and surface roughness due to the prevailing crystallization as well as the coarsening procedure. However small pores inside the films are eliminated at low temperature.
机译：在溶胶-凝胶ITO膜上处理了三种热途径，即常规热退火（CTA），快速热退火（RTA）和热循环退火（TCA）。通过掠入射小角X射线散射（GISAXS）技术表征了薄膜的近表面和内部结构。发现狭缝状孔隙在侧面呈分形结构，近表面稀疏，孔隙较大。当以高加热速率对膜进行退火时，会出现垂直于膜的有序孔结构。孔的收缩主要是由于过热过程中的结构松弛和扩散。但是，过冷过程对结构没有明显影响。此外，由于主要的结晶以及粗化步骤，CTA样品具有最大的孔隙率和表面粗糙度。然而，在低温下消除了膜内部的小孔。

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