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Relation between grazing incident X-ray diffraction and surface defects in silicon doped GaAs

机译:硅掺杂GaAs中掠入射X射线衍射与表面缺陷的关系

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摘要

Grazing incident X-ray diffraction is used to study oval defects on the surface of silicon doped GaAs layers grown by means of molecular beam epitaxy. The amplitude of the (1 1 3) peak from the diffraction data is associated with the defect density obtained from scanning electron microscopy images. These images reveal two different kinds of defects for all samples. It was proven that variations in the silicon effusion cell temperature affect the defect density. By increasing the cell temperature the defect density increases.
机译:掠入射X射线衍射用于研究通过分子束外延生长的硅掺杂GaAs层表面的椭圆形缺陷。来自衍射数据的(1 1 3)峰的振幅与从扫描电子显微镜图像获得的缺陷密度相关。这些图像揭示了所有样品的两种不同类型的缺陷。事实证明,硅扩散池温度的变化会影响缺陷密度。通过提高电池温度,缺陷密度增加。

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