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Enhanced optical properties of porous GaN by using UV-assisted electrochemical etching

机译:通过使用紫外线辅助电化学蚀刻增强多孔GaN的光学性能

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In this paper we report the fabrication of porous GaN by UV-assisted electrochemical etching with direct current densities of 5, 10 and 20 mA/cm ~2 for 20 min in electrolytes consisting of aqueous HF and ethanol C_2H_5OH (1:4). Scanning electron microscopy (SEM) demonstrates that current density has significant effect on the size and shape of the pores. Raman spectra of both as-grown and porous GaN exhibit phonon mode E_2 (high), A_1 (LO), A_1 (TO) and E_2 (low). There was a red shift in E_2 (low) and E_2 (high) and blue shift in A_1 (LO). The red shift in E_2 (high) indicates a relaxation of compressive stress in the porous GaN surface with respect to the underlying single crystalline epitaxial GaN. Peak intensity of photoluminescence (PL) spectra of the nanoporous GaN samples was observed to be enhanced and the crystal quality was improved with increase in etching current density as compared to as-grown GaN.
机译:在本文中,我们报告了在HF水溶液和乙醇C_2H_5OH(1:4)组成的电解质中,通过UV辅助电化学蚀刻在20分钟内产生的直流密度分别为5、10和20 mA / cm〜2的多孔GaN。扫描电子显微镜(SEM)表明,电流密度对孔的大小和形状具有重大影响。生长态和多孔GaN的拉曼光谱均显示出声子模式E_2(高),A_1(LO),A_1(TO)和E_2(低)。 E_2(低)和E_2(高)出现红移,而A_1(LO)出现蓝移。 E_2中的红移(高)表示相对于下面的单晶外延GaN,多孔GaN表面的压缩应力有所缓和。与生长的GaN相比,观察到纳米孔GaN样品的光致发光(PL)光谱的峰强度增强,并且随着蚀刻电流密度的增加晶体质量得到改善。

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