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首页> 外文期刊>Physics Letters, A >Two-dimensional fractal-like growth on semiconductors: The formation of continuous manganese monosilicide ultrathin films on Si(111)
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Two-dimensional fractal-like growth on semiconductors: The formation of continuous manganese monosilicide ultrathin films on Si(111)

机译:半导体上的二维分形生长:在Si(111)上形成连续的单硅化锰锰超薄膜

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摘要

Continuous crystalline MnSi ultrathin films with atomically flat surfaces, which are highly expected to find an application in Si-based spintronics, are grown on Si(111)-7×7 by solid phase epitaxy method. The interfacial reaction between Mn and Si and the formation processes of the films as well as their morphological variation with annealing temperature are investigated using scanning tunneling microscopy. The MnSi ultrathin films form in a two-dimensional (2D) fractal-like mode only at a Mn coverage above ~2 ML and at an annealing temperature in the narrow range of ~250-300 °C. Above ~300 °C, the growth mode gradually transforms into Volmer-Weber mode and correspondingly, the continuous films transform into 2D compact islands. The films grow with a thickness unit of quadruple layer, which is consistent with the B20-type MnSi structure.
机译:通过固相外延法在Si(111)-7×7上生长了具有原子平面的连续结晶MnSi超薄膜,人们期望将其应用于Si基自旋电子学中。利用扫描隧道显微镜研究了Mn和Si之间的界面反应,薄膜的形成过程以及随退火温度变化的形貌。 MnSi超薄膜仅在〜2 ML以上的Mn覆盖率和〜250-300°C的窄范围内的退火温度下才以二维(2D)分形模式形成。在〜300°C以上,生长模式逐渐转变为Volmer-Weber模式,相应地,连续膜转变为二维紧凑岛。薄膜以四层厚度单位生长,这与B20型MnSi结构一致。

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