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首页> 外文期刊>Journal of Applied Polymer Science >Silica/polyimide hybrids and their dielectric properties. I. Preparation with an improved sol-gel process with poly(amic acid) as the precursor
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Silica/polyimide hybrids and their dielectric properties. I. Preparation with an improved sol-gel process with poly(amic acid) as the precursor

机译：二氧化硅/聚酰亚胺杂化物及其介电性能。 I.以聚酰胺酸为前体的改进的溶胶-凝胶法制备

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摘要

A series of hybrid polyimide-silica hybrids films were prepared by a sol-gel process via the blending of tetrathoxysilane and a coupling reagent in a pyromellitic anhydride/4,4'-oxydianiline (ODA) based poly(amic acid) solution in N,N-dimethylacetamide, the casting of the films, the evaporation of the solvent, and thermal imidization, in that order. Fourier transform infrared, transmission electron microscopy, atomic force microscopy, and thermogravimetric analysis were used to characterize the structure of the obtained hybrids. The dispersion of silica in the hybrids was suggested to be in two states: a dominant network structure and minor discrete aggregate particles. On the basis of the network structure, the mechanical behavior of the hybrids was interpreted. An investigation of the dielectric properties revealed that the dielectric constant of the hybrids increased slowly with the concentration of SiO2. For hybrid films containing 30 wt % SiO2, the constant increased to 4.2 from the value of 3.2 for pure polyimide. Moreover, the incomplete hydrolysis and decomposition of tetrathoxysilane and the coupling reagent were the main factors contributing to the thermal stability and the uncertainty of the dielectric constant of the hybrids. © 2005 Wiley Periodicals, Inc.
机译：通过将四乙氧基硅烷和偶联剂在均苯四酸酐/ 4,4'-氧二苯胺（ODA）基的聚（酰胺酸）的N溶液中共混，通过溶胶-凝胶工艺制备了一系列杂化聚酰亚胺-二氧化硅杂化膜。 N-二甲基乙酰胺，薄膜的流延，溶剂的蒸发和热酰亚胺化依次进行。傅立叶变换红外，透射电子显微镜，原子力显微镜和热重分析被用来表征获得的杂种的结构。二氧化硅在杂化体中的分散被认为处于两种状态：主要的网络结构和次要的离散聚集颗粒。基于网络结构，解释了杂种的机械性能。介电性能的研究表明，杂化体的介电常数随着SiO2浓度的增加而缓慢增加。对于包含30 wt％SiO2的混合薄膜，常数从纯聚酰亚胺的3.2值增加到4.2。此外，四乙氧基硅烷和偶联剂的不完全水解和分解是影响杂化物热稳定性和介电常数不确定性的主要因素。 ＆复制; 2005 Wiley期刊公司

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