• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Journal of Applied Polymer Science >N-isopropylacrylamide decomposition process in helium plasma
【24h】

N-isopropylacrylamide decomposition process in helium plasma

机译：N-异丙基丙烯酰胺在氦等离子体中的分解过程

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Emission spectroscopy was applied to observe decomposed species of N-isopropylacrylamide (NIPAAm) exposed to He plasma, which was generated by AC discharge at the pressure of 400 Pa. As the NIPAAm monomer was exposed to He plasma, light emitted from the NIPAArn and plasma was monitored. In the diagnosis measurement, several emission peaks assigned to the H, and Hp atomic lines, CH3O, CN(B-2 Sigma-X-2 Pi),CH(A(2)Delta-X-2 Pi), and C3H5, CN, CHO, CH2O, and C4H2+ transitions were observed and measured at various discharge times. The present results show the presence Of C4H2 and C4H2+*, which are not manifested in great concentration in the Simulation of RF acetylene discharge. The time dependence of the emission intensities was also investigated. When the discharge time of He plasma was increased, the emission intensities of the observed transitions also increased and then gradually decreased. (c) 2006 Wiley Periodicals, Inc.
机译：应用发射光谱法观察暴露于He等离子体的N-异丙基丙烯酰胺（NIPAAm）的分解物种，该物种是通过在400 Pa的压力下通过交流放电产生的。被监视。在诊断测量中，将几个发射峰分配给H和Hp原子线CH3O，CN（B-2 Sigma-X-2 Pi），CH（A（2）Delta-X-2 Pi）和C3H5，在各种放电时间观察到并测量了CN，CHO，CH2O和C4H2 +的跃迁。目前的结果表明存在C4H2和C4H2 + *，它们在RF乙炔放电模拟中并未高度集中。还研究了发射强度的时间依赖性。当He等离子体的放电时间增加时，观察到的跃迁的发射强度也增加，然后逐渐降低。 （c）2006年Wiley Periodicals，Inc.

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号