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首页> 外文期刊>Journal of Applied Polymer Science >Synthesis of UV-Curable/Alkali-Soluble Dispersants Used for Black Photoresist with a High Loading of Carbon Black
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Synthesis of UV-Curable/Alkali-Soluble Dispersants Used for Black Photoresist with a High Loading of Carbon Black

机译：高载量炭黑用于黑色光刻胶的紫外光固化/碱溶性分散剂的合成

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摘要

This research synthesized a functional dispersant, not only providing a good dispersion of carbon black (CB) but also possessing ultraviolet (UV)-curable and alkali-soluble properties, by a two-step process. Firstly, bisphenol-A epoxy diacrylate was reacted with benzophenone tetracarboxylic dianhydride at different molar ratios to obtain UV-curable/alkali-soluble resins. In the second step, these resins would possess dispersion ability of CB by reaction with an isocyanate-containing methacrylate. The prepared dispersants were evaluated by their dispersion ability and the light absorption property of CB. The results showed that one of the dispersants was able to disperse CB in the solvent up to 10 wt % with a mean particle size about 100 nm. This particular dispersant had a moderate amount of amino-containing groups (such as urethane, amide, and imide) serving as anchoring sites on CB, and a sufficiently long chain (M-n similar to 2600) to provide a steric repulsion among CB particles. The advantage of this CB/dispersant system is that no other curable resins are needed. By using a suitable photoinitiator, the present CB/dispersant system could reach a polymerization rate of 1.05 x 10(-3) (s(-1)), and a black pattern of 10 mu m in width on a glass substrate was obtained through an UV-lithography process.
机译：这项研究通过两步法合成了一种功能分散剂，该分散剂不仅提供了良好的炭黑（CB）分散性，而且还具有可紫外线（UV）固化和碱溶的特性。首先，使双酚A型环氧二丙烯酸酯与二苯甲酮四羧酸二酐以不同的摩尔比反应，以获得可UV固化/可溶于碱的树脂。在第二步骤中，这些树脂通过与含异氰酸酯的甲基丙烯酸酯反应将具有CB的分散能力。通过它们的分散能力和CB的光吸收性能评价所制备的分散剂。结果表明，一种分散剂能够将CB分散至溶剂中至多10wt％，平均粒径为约100nm。这种特殊的分散剂具有适量的含氨基基团（例如氨基甲酸酯，酰胺和酰亚胺）充当CB的锚定位点，并且具有足够长的链（M-n类似于2600）以在CB颗粒之间提供空间排斥。这种CB /分散剂系统的优点是不需要其他可固化树脂。通过使用合适的光引发剂，本发明的CB /分散剂体系可以达到1.05 x 10（-3）（s（-1））的聚合速率，并通过玻璃基板获得了宽度为10μm的黑色图案。紫外光刻工艺。

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