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首页> 外文期刊>Journal of Applied Polymer Science >Patterning of soft polydimethylsiloxane elastomers using plasma etching
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Patterning of soft polydimethylsiloxane elastomers using plasma etching

机译：使用等离子蚀刻对柔软的聚二甲基硅氧烷弹性体进行构图

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Soft polydimethylsiloxane (PDMS) elastomers spin coated on silicon wafers are patterned using plasma etching. The elastomers are formed by mixing vinyl-terminated PDMS (prepolymer) and crosslinker containing hydride sites. The elastomers are made softer by adding either excess prepolymer, excess crosslinker, or swelling agent. The different elastomers were etched using reactive ion etching, an old and well established processing technology in the microelectronic and MEMS industry. The etch rate and profiles of the etched surfaces were dependent on the process pressure. The dependence was different for the different elastomers. It was found that at low pressure, the etch rate was dependent on the shear modulus. At high pressures, the etch rate was dependent on the chemical composition of the elastomer. The results for the swollen elastomers were different from those for the nonswollen elastomers. The etch rate was lower and the profiles of the etched cavities were different.
机译：使用等离子蚀刻对旋涂在硅片上的软聚二甲基硅氧烷（PDMS）弹性体进行构图。通过混合乙烯基封端的PDMS（预聚物）和含氢化物位点的交联剂来形成弹性体。通过添加过量的预聚物，过量的交联剂或溶胀剂，可使弹性体更柔软。使用反应离子刻蚀对不同的弹性体进行刻蚀，反应离子刻蚀是微电子和MEMS行业中一种古老而完善的加工技术。蚀刻速率和蚀刻表面的轮廓取决于工艺压力。不同弹性体的依赖性不同。发现在低压下，蚀刻速率取决于剪切模量。在高压下，蚀刻速率取决于弹性体的化学组成。溶胀的弹性体的结果不同于未溶胀的弹性体的结果。蚀刻速率较低，并且蚀刻腔的轮廓不同。

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