Styryl Silsesquioxane Photoresist

Sugita Hikaru; Tanaka Kei; Shirato Kaori; Yamamoto Ryota; Tateshima Kazuko

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Styryl Silsesquioxane Photoresist

机译：苯乙烯基倍半硅氧烷光刻胶

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There is a substantial need for photopattern-able, heat resistant, and transparent materials that are applicable to electronic devices, such as imaging or display elements. Styryl silsesquioxane based photoresist forms thin micro patterns after i-line exposure and alkaline development, and the resulting transparent film shows remarkable heat resistance. Radicals generated from a photoinitiator induce polymerization of styryl functionality in the photoresist film to form the micropatterns. (C) 2014 Wiley Periodicals, Inc.

机译：迫切需要适用于电子设备（如成像或显示元件）的可光图案化，耐热且透明的材料。基于苯乙烯倍半硅氧烷的光致抗蚀剂在i线曝光和碱性显影后形成薄的微图案，并且所得的透明膜显示出显着的耐热性。由光引发剂产生的自由基引起光致抗蚀剂膜中苯乙烯基官能团的聚合，从而形成微图案。（C）2014威利期刊公司

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来源
《Journal of Applied Polymer Science》 |2015年第8期|共8页
作者
Sugita Hikaru; Tanaka Kei; Shirato Kaori; Yamamoto Ryota; Tateshima Kazuko;
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正文语种 eng
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关键词
coatings; photochemistry; photopolymerization; structure-property relations;

机译：涂料;光化学;光聚合;结构性质关系;

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1. Styryl Silsesquioxane Photoresist [J] . Sugita Hikaru, Tanaka Kei, Shirato Kaori, Journal of Applied Polymer Science . 2015,第7a8期

机译：苯乙烯基倍半硅氧烷光刻胶
2. Effect of 3 rd monomer addition on styrene/styryl-polyhedral oligomeric silsesquioxane (POSS) copolymerization [J] . He-xin Zhang, Ho-young Lee, Young-jun Shin, Macromolecular Research . 2009,第5期

机译：第三次添加单体对苯乙烯/苯乙烯基-多面体低聚倍半硅氧烷（POSS）共聚的影响
3. Effect of 3~(rd) Monomer Addition on Styrene/Styryl-Polyhedral Oligomeric Silsesquioxane (POSS) Copolymerization [J] . He-xin Zhang, Ho-young Lee, Young-jun Shin Macromolecular Research . 2009,第5期

机译：3〜（rd）单体加成对苯乙烯/苯乙烯-多面体低聚倍半硅氧烷（POSS）共聚的影响
4. Synthesis of Epoxidised Silsesquioxane Polymer as Negative Photoresist in Photolithography Application [C] . Mohamad Riduwan Ramli, Zulkifli Ahmad, Khairudin Mohamed International Conference on Advanced Material Engineering and Technology . 2015

机译：将环氧化倍半硅氧烷聚合物的合成作为光刻应用中的负光致抗蚀剂
5. Design and study of advanced photoresist materials: Positive tone photoresists with reduced environmental impact and materials for 157 nm lithography. [D] . Yamada, Shintaro. 2000

机译：高级光刻胶材料的设计和研究：减少环境影响的正性光刻胶和用于157 nm光刻的材料。
6. THE ANTISEPTIC ACTION OF THE STYRYL-PYRIDINES AND STYRYL-QUINOLINES [O] . C. H. Browning, J. B. Cohen, S. Ellingworth, 1923

机译：苯乙烯基-吡啶和苯乙烯基-喹啉的对映体作用
7. Synthesis of Epoxidised Silsesquioxane Polymer as Negative Photoresist in Photolithography Application [O] . Mohamad Riduwan Ramli, Zulkifli Ahmad, Khairudin Mohamed, 2016

机译：在光刻应用中作为负性光刻胶的环氧化倍半硅氧烷聚合物的合成
8. Gas Phase Structural Characterization of Polyhedral Oligomeric Silsesquioxanes (POSS) with Styryl and Epoxy Phenyl Capping Agents [R] . Baker, E. S. , Gidden, J. , Anderson, S. E. , 2004

机译：具有苯乙烯基和环氧苯基封端剂的多面体低聚倍半硅氧烷（pOss）的气相结构表征

Styryl Silsesquioxane Photoresist

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