Characterization of chromium thin films by sputter deposition

Sea-Fue Wang; Hsui-Chi Lin; Hui-Yun Bor

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Characterization of chromium thin films by sputter deposition

机译：通过溅射沉积表征铬薄膜

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In this study, a systematic investigation on the deposition of Cr-CrO_x bi-layer film was performed by magnetron DC sputtering. The X-ray photoelectron spectrometer (XPS) examining the bare Cr film showed that the peaks of Cr 2P_(3/2) and Cr 2P_(1/2) appeared in the Cr thin film associated with the presence of a 12 nm oxide layer. The transmission was reduced to zero as the Cr film exceeded 100 nm in thickness. The reflection saturated at a value of ~55% when the thickness of the Cr film reached 30 nm. The optical density exceeded 3.50 with a Cr film thickness over 150 nm.

机译：在这项研究中，通过磁控管直流溅射对Cr-CrO_x双层膜的沉积进行了系统的研究。 X射线光电子能谱仪（XPS）检查了裸露的Cr膜，表明Cr 2P_（3/2）和Cr 2P_（1/2）的峰出现在Cr薄膜中，与存在12 nm氧化层有关。当Cr膜的厚度超过100nm时，透射率降低到零。当Cr膜的厚度达到30 nm时，反射达到〜55％的饱和值。 Cr膜厚度超过150 nm时，光密度超过3.50。

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《Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics》 |2011年第41期|共5页
作者
Sea-Fue Wang; Hsui-Chi Lin; Hui-Yun Bor;
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正文语种 eng
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关键词
Chromium thin films; Optical properties; Sputtering;

机译：铬薄膜;光学性能;溅射;

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1. Characterization of chromium thin films by sputter deposition [J] . Sea-Fue Wang, Hsui-Chi Lin, Hui-Yun Bor Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics . 2011,第41期

机译：通过溅射沉积表征铬薄膜
2. High-rate sputter deposition of chromium oxide thin films using water vapor as a reactive gas [J] . Wang Fan, Abe Yoshio, Kawamura Midori, Surface & Coatings Technology . 2020,第1期

机译：使用水蒸气作为反应气体的氧化铬薄膜的高速溅射沉积
3. Glancing angle deposition to modify microstructure and properties of sputter deposited chromium thin films [J] . Lintymer J., Gavoille J., Martin N., Surface & Coatings Technology . 2003,第0期

机译：掠射角沉积可改变溅射沉积的铬薄膜的微观结构和性能
4. Deposition and characterization of ZnO, ZnO:Al thin films deposited by rf-sputtering for Cu(In,Ga)Se2 thin film solar cells processing by physical vapor deposition [C] . J.Sastré-Hernández, F.A.Zubieta-López, M.Tufi(n)o-Velázquez, The 22nd International photovoltaic science and engineering conference . 2012

机译：射频溅射通过物理气相沉积处理Cu（In，Ga）Se2薄膜太阳能电池的ZnO，ZnO：Al薄膜的沉积和表征
5. Evolution of microstructure and residual stress in sputtered chromium and chromium(x) nitrogen(y) thin films. [D] . Zhao, Zhibo. 1999

机译：溅射的铬和铬（x）氮（y）薄膜的微观结构和残余应力的演变。
6. Structural and optical characteristics determined by the sputtering deposition conditions of oxide thin films [O] . Petronela Prepelita, Florin Garoi, Valentin Craciun 2021

机译：由氧化物薄膜的溅射沉积条件确定的结构和光学特性
7. Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas [O] . 2013

机译：在空气存在下使用反应性不平衡磁控溅射制备的氮氧化物薄膜的生长和表征作为反应气体
8. Sputter deposition and characterization of lithium cobalt oxide thin films and their applications in thin-film rechargeable lithium batteries [R] . Wang, B. , Bates, J. B. , Luck, C. F. , 1996

机译：锂钴氧化物薄膜的溅射沉积和表征及其在薄膜可充电锂电池中的应用

Characterization of chromium thin films by sputter deposition

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