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首页> 外文期刊>Journal of Materials Science >Influence of fabrication parameters on crystallization, microstructure, and surface composition of NbN thin films deposited by rf magnetron sputtering
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Influence of fabrication parameters on crystallization, microstructure, and surface composition of NbN thin films deposited by rf magnetron sputtering

机译：制备参数对射频磁控溅射沉积NbN薄膜的结晶，微结构和表面组成的影响

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摘要

In this work NbN thin films have been grown by magnetron rf sputtering of a δ-NbN (99.99%) target. In particular, the influence of certain fabrication parameters (substrate temperature, power supplied to the target or additional N_2 flux in the preparation chamber) on the crystallization, microstructure, and surface composition of the deposited films have been studied. The films have been characterized by X-ray diffraction (XRD) at grazing angle in the θ-2θ configuration, scanning electron microscopy (SEM), wavelength dispersive spectrometry (WDS), and X-ray photoelectron spectroscopy (XPS). XRD results show that films grown at a substrate temperature of 573 K and a power supply applied to the target of 300 W present the same crystalline structure of the target while films grown at these temperature and power supply conditions plus the additional presence of N _2 during fabrication, grow highly textured along the plane (200). SEM results indicate that the films present columnar growth and a high homogeneity. WDS analysis shows that films grown at 573 K and 300 W are stoichiometric. XPS shows a complex surface composition of the films most external 5 nm, indicating the presence of niobium nitride (NbN _x), niobium oxy-nitride (NbN _x O _y), and niobium oxide (Nb_2O_5).
机译：在这项工作中，已通过磁控管射频溅射δ-NbN（99.99％）靶材生长了NbN薄膜。尤其是，已经研究了某些制造参数（基底温度，提供给目标的功率或制备腔室中额外的N_2通量）对沉积膜的结晶度，微观结构和表面成分的影响。膜的特征在于，在掠射角为θ-2θ的情况下进行X射线衍射（XRD），扫描电子显微镜（SEM），波长色散光谱（WDS）和X射线光电子光谱（XPS）。 XRD结果表明，在573 K的基板温度下生长的薄膜和施加至300 W靶材的电源呈现出与靶材相同的晶体结构，而在这些温度和电源条件下生长的薄膜加上N _2的存在制造时，沿平面（200）生长高度纹理。 SEM结果表明该膜呈现柱状生长并且具有高均匀性。 WDS分析表明，在573 K和300 W下生长的薄膜是化学计量的。 XPS显示最外层5 nm处的薄膜具有复杂的表面成分，表明存在氮化铌（NbN_x），氮氧化铌（NbN_x O_y）和氧化铌（Nb_2O_5）。

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