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首页> 外文期刊>Journal of nanoscience and nanotechnology >Study on Effect of Plasma Surface Treatments for Diamond Deposition by DC Arc Plasmatron
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Study on Effect of Plasma Surface Treatments for Diamond Deposition by DC Arc Plasmatron

机译：直流电弧等离子体发生器等离子表面处理对金刚石沉积的影响研究

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摘要

To improve the thermal conductivity and wear resistance of ceramic materials in the field of renewable energy technologies, diamond coating by plasma processing has been carried out in recent years. This study's goal is to improve diamond deposition on Al_2O_3 ceramic substrates by plasma surface treatments. Before diamond deposition was carried out in a vacuum, plasma surface treatments using Ar gas were conducted to improve conditions for deposition. We also conducted plasma processing for diamond deposition on Al_2O_3 ceramic substrates using a DC arc Plasmatron. The Al_2O_3 ceramic substrates with diamond film (5 × 15 mm~2), were investigated by SEM (Scanning Electron Microscopy), AFM (Atomic Force Microscopy) and XRD (X-ray Diffractometer). Then, the C - H stretching of synthetic diamond films by FTIR (Fourier Transform Infrared Spectroscopy) was studied. We identified nanocrystalline diamond films on the Al_2O_3 ceramic substrates. The results showed us that the deposition rate of diamond films was 2.3 μm/h after plasma surface treatments. Comparing the above result with untreated ceramic substrates, the deposition rate improved with the surface roughness of the deposited diamond films.
机译：为了在可再生能源技术领域中提高陶瓷材料的导热性和耐磨性，近年来已经进行了通过等离子体处理的金刚石涂层。这项研究的目的是通过等离子体表面处理来改善金刚石在Al_2O_3陶瓷基底上的沉积。在真空中进行金刚石沉积之前，进行了使用氩气的等离子体表面处理以改善沉积条件。我们还使用直流电弧等离子体发生器对Al_2O_3陶瓷基板上的金刚石沉积进行了等离子体处理。通过SEM（扫描电子显微镜），AFM（原子力显微镜）和XRD（X射线衍射仪）研究了具有金刚石膜（5×15 mm〜2）的Al_2O_3陶瓷基体。然后，研究了通过傅立叶变换红外光谱（FTIR）对合成金刚石膜的CH-H拉伸。我们在Al_2O_3陶瓷基板上确定了纳米晶金刚石膜。结果表明，经过等离子体表面处理后，金刚石膜的沉积速率为2.3μm/ h。将上述结果与未处理的陶瓷基板进行比较，沉积速率随沉积的金刚石膜的表面粗糙度而提高。

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