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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >RECOIL IMPLANTATION OF ALPHA SOURCES FOR THICKNESS MEASUREMENT OF THIN FILMS
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RECOIL IMPLANTATION OF ALPHA SOURCES FOR THICKNESS MEASUREMENT OF THIN FILMS

机译:阿尔法源的反冲植入以测量薄膜的厚度

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摘要

A sequence of radioactive decays can be used to implant alpha-emitting sources in substrates for thickness measurements of films grown on them. Starting with Th-228, both direct recoil implantation of Ra-224 and a two-stage recoil implantation of Pb-212 were performed. The thickness of germanium layers grown on gallium arsenide was determined by measuring the energy loss of the alpha particles traversing them. The results were found to be consistent with those obtained by other methods. The special advantages of the present procedure are discussed. [References: 8]
机译:一系列放射性衰变可用于将α发射源植入衬底中,以测量在其上生长的薄膜的厚度。从Th-228开始,进行了Ra-224的直接后坐植入和Pb-212的两阶段后坐植入。在砷化镓上生长的锗层的厚度是通过测量横穿它们的α颗粒的能量损失来确定的。发现结果与通过其他方法获得的结果一致。讨论了本程序的特殊优点。 [参考:8]

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