Condensation coefficients in plasma sputtering deposition

Brault P; Thomann AL; Rozenbaum JP

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Condensation coefficients in plasma sputtering deposition

机译：等离子溅射沉积中的凝结系数

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Optical emission spectroscopy and Rutherford backscattering spectrometry are combined to determine condensation coefficients for plasma sputtering deposition. The method is applied for palladium deposition onto various substrates and condensation coefficients are found to lie between 0.4 and 0.9.

机译：结合光发射光谱法和卢瑟福背散射光谱法来确定等离子体溅射沉积的冷凝系数。该方法用于将钯沉积到各种衬底上，并且凝结系数在0.4和0.9之间。

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《Journal of Physics, D. Applied Physics: A Europhysics Journal》 |2007年第7期|共3页
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Brault P; Thomann AL; Rozenbaum JP;
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1. Condensation coefficients in plasma sputtering deposition [J] . Brault P, Thomann AL, Rozenbaum JP Journal of Physics, D. Applied Physics: A Europhysics Journal . 2007,第7期

机译：等离子溅射沉积中的凝结系数
2. Kinetic behaviour of ion injection in WO_3 based films produced by sputter and sol-gel deposition: Part II. Diffusion coefficients [J] . Wang Junqiang, Bell John M. Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion . 1999,第4期

机译：通过溅射和溶胶-凝胶沉积制备的基于WO_3的薄膜中离子注入的动力学行为：第二部分。扩散系数
3. Thin films prepared by a hybrid deposition configuration combining two laser ablation plasmas with one sputtering plasma [J] . Escobar-Alarcon L., Solis-Casados D. A., Romero S., Applied Physics . 2020,第1期

机译：通过将两种激光烧蚀等离子体与一个溅射等离子体结合在一起的混合沉积配置制备的薄膜
4. Self-organization effects during sputter deposition under quasi-equilibrium condensation conditions [C] . Yu. O. Kosminska, V. I. Perekrestov, Yu. O. Rybalko, 2016 International Conference on Nanomaterials: Application amp; Properties . 2016

机译：准平衡冷凝条件下溅射沉积过程中的自组织效应
5. Application of diamond films to electric propulsion: Low energy sputter yield measurement and MPD plasma assisted chemical vapor deposition. [D] . Blandino, John Joseph. 2001

机译：金刚石薄膜在电推进中的应用：低能量溅射产率测量和MPD等离子体辅助化学气相沉积。
6. In situ and real-time monitoring of structure formation during non-reactive sputter deposition of lanthanum and reactive sputter deposition of lanthanum nitride [O] . Bärbel Krause, Dmitry S. Kuznetsov, Andrey E. Yakshin, -1

机译：镧的非反应性溅射沉积和氮化镧的反应性溅射沉积过程中结构形成的原位和实时监测
7. Condensation coefficients in plasma sputtering deposition [O] . Pascal Brault, Anne-lise Thomann 2008

机译：等离子溅射沉积中的凝结系数
8. Phenomenological Model for Surface Deposition Kinetics during Plasma and Sputter Deposition of Amorphous Hydrogenated Silicon [R] . Kushner, M. J. 1987

机译：等离子体表面沉积动力学与非晶态氢化硅溅射沉积的动力学模型

Condensation coefficients in plasma sputtering deposition

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