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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Modelling of plasma generation and thin film deposition by a non-thermal plasma jet at atmospheric pressure
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Modelling of plasma generation and thin film deposition by a non-thermal plasma jet at atmospheric pressure

机译:在大气压下通过非热等离子体射流模拟等离子体产生和薄膜沉积

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摘要

The gas flow and plasma in a miniaturized non-thermal atmospheric pressure plasma jet for plasma enhanced chemical vapour deposition has been investigated by means of hydrodynamic modelling. The investigation focuses on the interplay between the plasma generation in the active zone where the power is supplied by an rf voltage to the filaments, the transport of active plasma particles due to the gas flow into the effluent, their reactions with the thin film precursor molecules and the transport of precursor fragments towards the substrate. The main features of the spatially two-dimensional model used are given. The results of the numerical modelling show that most active particles of the argon plasma are mainly confined within the active volume in the outer capillary of the plasma jet, with the exception of molecular argon ions which are transported remarkably into the effluent together with slow electrons. A simplified model of the precursor kinetics yields radial profiles of precursor fragment fluxes onto the substrate, which agree qualitatively with the measured profiles of thin films obtained by static film deposition experiments.
机译:通过流体动力学模型研究了用于等离子体增强化学气相沉积的小型非热大气压力等离子体射流中的气流和等离子体。研究集中在活性区域中的等离子体产生之间的相互作用,在活性区域中,通过射频电压向灯丝提供功率,由于气体流入流出物中而引起的活性等离子体颗粒的传输,它们与薄膜前体分子的反应和前体碎片向基材的运输。给出了所使用的空间二维模型的主要特征。数值模拟的结果表明,除了分子氩离子与缓慢的电子一起显着地转移到流出物中外,大多数氩等离子体的活性颗粒主要被限制在等离子束外毛细管的活性容积内。前体动力学的简化模型可得出前体碎片通量在基材上的径向分布,其与通过静态膜沉积实验获得的薄膜的实测分布在质量上吻合。

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