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Tuning the electronic structure of single-walled carbon nanotube by high-pressure H-2 exposure

机译:高压H-2曝光调整单壁碳纳米管的电子结构

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We report on an electronic structure change of single-walled carbon nanotube (SWNT) on hexagonal boron nitride due to electron doping via high-pressure H-2 exposure. The fractional coverage of hydrogenated carbon atom is estimated to be at least theta = 0.163 from the in situ I-ds-V-g measurements of the release process. Raman spectroscopy and x-ray photoelectron spectroscopy were carried out to support the in situ electrical measurements. In particular, we used the dissociative Langmuir-type model to yield the desorption coefficient k(des) by fitting it to the in situ electrical data. Finally, we applied this hydrogenation method to the SWNT network on the commercial Si/SiO2 substrate to open the possibility of the scalable n-type semiconducting SWNT FETs.
机译:我们通过高压H-2曝光引起的电子掺杂引起的单壁碳纳米管(SWNT)的电子结构改变报告了六角形氮化物上的电子结构变化。 从释放过程的原位I-DS-V-G测量中估计氢化碳原子的分数覆盖率至少为θ= 0.163。 进行拉曼光谱和X射线光电子能谱,以支持原位电测量。 特别地,我们使用了解离朗马型模型来产生解吸系数K(DES),通过将其拟合到原位电气数据。 最后,我们将该氢化方法应用于商业Si / SiO2基板上的SWNT网络,以打开可伸缩的n型半导体SWNT FET的可能性。

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