Helium focused ion beam irradiation with subsequent chemical etching for the fabrication of nanostructures

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Helium focused ion beam irradiation with subsequent chemical etching for the fabrication of nanostructures

机译：氦聚焦离子束照射，随后的化学蚀刻用于制备纳米结构

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In this paper we demonstrate a nanofabrication technique based on local ion irradiation of silicon dioxide with a focused helium ion beam. The wet etching of silicon dioxide irradiated with a focused helium ion beam is described in a two-dimensional case both numerically and experimentally. We suggest a model for the etching process based on the distribution of ion induced defects in the irradiated material. The profile of the surface of the etched silicon dioxide is simulated and compared with the results from scanning electron microscopy. Fabrication of a suspended nanostring with a diameter of less than 20 nm by means of etching ion-irradiated material is demonstrated.

机译：本文用聚焦氦离子束展示了基于局部离子照射的基于局部离子照射的纳米制作技术。用聚焦氦离子束照射的二氧化硅的湿法蚀刻在数字和实验上的二维壳中描述。我们建议一种基于辐照材料中离子诱导缺陷的分布的蚀刻过程的模型。模拟蚀刻二氧化硅表面的轮廓并与扫描电子显微镜的结果进行比较。通过蚀刻离子照射材料制造直径小于20nm的悬浮纳米型纳米型纳米型纳米型纳米型纳米型纳米型纳米型纳米型。

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《Nanotechnology》 |2020年第21期|共9页
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正文语种 eng
中图分类特种结构材料;
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silicon dioxide; helium ion microscope; nanostring; ion beam enhanced etching;

机译：二氧化硅;氦离子显微镜;纳米梁;离子束增强蚀刻;

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1. Helium focused ion beam irradiation with subsequent chemical etching for the fabrication of nanostructures [J] . Nanotechnology . 2020,第21期

机译：氦聚焦离子束照射，随后的化学蚀刻用于制备纳米结构
2. Facile fabrication of functional 3D micro-nano architectures with focused ion beam implantation and selective chemical etching [J] . Garg Vivek, Mote Rakesh G., Fu Jing Applied Surface Science . 2020,第Octa1期

机译：具有聚焦离子束植入和选择性化学蚀刻的功能3D微型纳米架构的外观制造
3. Sub-micrometer-scale patterning on Zr-based metallic glass using focused ion beam irradiation and chemical etching [J] . Kawasegi N, Morita N, Yamada S, Nanotechnology . 2007,第37期

机译：使用聚焦离子束辐照和化学蚀刻在Zr基金属玻璃上进行亚微米级构图
4. Fabrication of Nanopores in Silicon Nitride Membrane by Means of Wet Etching Enhanced by Focused Helium Ion Beam Irradiation [C] . Yu.V. Petrov, E.V. Ubyivovk, A.P. Baraban International Conference "State-of-the-Art Trends of Scientific Research of Artificial and Natural Nanoobjects" . 2019

机译：通过聚焦氦离子束照射增强湿法蚀刻氮化硅膜中纳米孔的制造
5. Optical channel waveguide formation by focused ion beam induced selective mixing and wet chemical etching: Design, fabrication and characterization. [D] . Kumar, Mukesh. 1997

机译：通过聚焦离子束诱导的选择性混合和湿法化学蚀刻形成光通道波导：设计，制造和表征。
6. Focused helium-ion beam irradiation effects on electrical transport properties of few-layer WSe2: enabling nanoscale direct write homo-junctions [O] . Michael G. Stanford, Pushpa Raj Pudasaini, Alex Belianinov, -1

机译：聚焦氦离子束辐照对几层WSe2的电输运性能的影响：实现纳米级直接写入同质结
7. Focused ion beam fabrication of metallic nanostructures on end faces of optical fibers for chemical sensing applications [O] . A. Dhawan, J. F. Muth, D. N. Leonard, 2008

机译：用于化学传感应用的光纤端面金属纳米结构的聚焦离子束制造
8. Fabrication of Visibly Photoluminescent Si Microstructures by Focused Ion BeamImplantation and Wet Etching [R] . Xu, J., Steckl, A. J. 1994

机译：聚焦离子束注入和湿法刻蚀制备可见光致发光si微结构

Helium focused ion beam irradiation with subsequent chemical etching for the fabrication of nanostructures

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