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Hierarchy and scaling behavior of multi-rank domain patterns in ferroelectric K0.9Na0.1NbO3 strained films

机译:铁电K0.9N0.1nBO3紧张薄膜多级域模式的层次结构和缩放行为

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摘要

The formation process of a ferroelectric multi-rank domain pattern in the thickness range of 7-52 nm is investigated for monoclinic K0.9Na0.1NbO3 strained epitaxial films on (110) NdScO3 substrates. Although the elastic strain energy density is degenerated for two pseudocubic orientations, a distinctive hierarchy of domain evolution is observed with exclusive in-plane a(1)a(2) domains for very thin films and the retarded onset of a ferroelectric MC phase at larger film thickness. This is accompanied by a thickness dependent transformation from stripe domains to a herringbone pattern and, eventually, for the thickest film, to a checkerboard-like structure. These transformations in the domain arrangement and width are correlated to energetic aspects as depolarization field and anisotropic strain relaxation in the film. While for the M-C domains plastic strain relaxation is throughout observed, the a(1)a(2) domains show a two-step strain relaxation mechanism starting with an in-plane elastic shearing, which is followed by plastic lattice relaxation. Our results highlight a pathway for engineering and patterning of periodic ferroelectric domain structures.
机译:研究了在(110)NdSCO 3衬底上的单斜斜晶k0.9na0.1nbO3应变外延膜的厚度范围内的铁电多级结构域图案的形成过程。尽管弹性应变能量密度为两个伪定向而退化,但是用用于非常薄膜的异面A(1)A(2)个结构域并在较大的较大的铁电MC相的延迟发作的域(1)A(2)域观察到域进化的独特层次。薄膜厚度。这伴随着从条纹域到横向结构的条纹域的厚度依赖性变换,并且最终是最厚的胶片到棋盘上的结构。域排列和宽度中的这些变换与能量方面相关,作为薄膜的去极化场和各向异性应变松弛。虽然对于M-C结构域塑料应变弛豫始终观察到,A(1)A(2)个域显示出一种从面内弹性剪切开始的两步应变弛豫机构,其次是塑料晶格松弛。我们的结果突出了一条途径,用于定期铁电域结构的工程和图案化。

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