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Quantification of defects engineered in single layer MoS2

机译:单层MOS2中工程化的缺陷的量化

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摘要

Atomic defects are controllably introduced in suspended single layer molybdenum disulfide (1L MoS2) using helium ion beam. Vacancies exhibit one missing atom of molybdenum and a few atoms of sulfur. Quantification was done using a Scanning Transmission Electron Microscope (STEM) with an annular detector. Experimentally accessible inter-defect distance was employed to measure the degree of crystallinity in 1L MoS2. A correlation between the appearance of an acoustic phonon mode in the Raman spectra and the inter-defect distance was established, which introduces a new methodology for quantifying defects in two-dimensional materials such as MoS2.
机译:使用氦离子束可控地将原子缺陷被可控地引入悬浮的单层钼二硫化钼(1L MOS2)。 空缺展示钼缺失的原子和少数硫原子。 使用具有环形检测器的扫描透射电子显微镜(阀杆)进行量化。 实验可访问的缺陷间距离用于测量1L MOS2中的结晶度。 建立了拉曼光谱中的声学声子模式与缺陷间距离之间的相关性,这引入了用于量化诸如MOS2的二维材料中的缺陷的新方法。

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  • 来源
    《RSC Advances》 |2020年第39期|共6页
  • 作者单位

    North Carolina A&

    T State Univ Dept Nanoengn 2907 East Gate City Blvd Greensboro NC 27401 USA;

    Univ North Carolina Greensboro Dept Nanosci 2907 East Gate City Blvd Greensboro NC 27401 USA;

    North Carolina A&

    T State Univ Dept Nanoengn 2907 East Gate City Blvd Greensboro NC 27401 USA;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学;
  • 关键词

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